SemiStory Equipment List (23.09.27)
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| SemiStory
Equipment List _ 23.09.27 |
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| NO | Asset NO | EQUIPMENT | MAKER | MODEL | Q'ty | Remark |
| 1 | 161150001 | Plasma Cleaner | JESAGI | JSPES-W21 | 1 | Photo |
| 2 | 199190001 | MOCVD | AIXTRON | AIX200/4RFS(2"x3) | 1 | Photo |
| 3 | 121210001 | Gas Analyzer | Tera Tech | HALO+ | 1 | Photo |
| 4 | 121210005 | Clean Air (Moving
Scrubber) |
NTW-MSE2000S(B) | New Tech Wave | 1 | Photo |
| 5 | 151180002 | PECVD | PECVD System | 1 | Photo | |
| 6 | 111190001 | Sputter | ULVAC | ENTRON | 1 | Photo |
| 7 | 121210006 | Ion
Sputter&Coater |
Cressington | 108Auto | 1 | Photo |
| 8 | 121210007 | E-beam | Cha Industries | Resolution | 1 | Photo |
| 9 | 121210008 | E-beam | Cha Industries | Resolution | 1 | Photo |
| 10 | 121210009 | E-beam | Cha Industries | Resolution | 1 | Photo |
| 11 | 121210067 | RTP | YEST | YIT-6032 | 1 | Photo |
| 12 | 121180110 | ICP Etcher | SUNIC | TENACIER-400VE | 1 | Photo |
| 13 | 199180022 | ICP Etcher | Maxis | 300L | 1 | Photo |
| 14 | 121210068 | ICP Etcher | Tainics | TE3100 | 1 | Photo |
| 15 | 199180018 | ICP Etcher | Tainics | TE3100 | 1 | Photo |
| 16 | 121210069 | ICP Etcher | Oxford | Plasmalab100-ICP380 | 1 | Photo |
| 17 | 121210070 | ICP Etcher | Top Eng | LX-380 | 1 | Photo |
| 18 | 124180001 | XeF2 Etcher | Boundless system | Genius 1125 | 1 | Photo |
| 19 | 199180028 | Track | GMT | MEG8-CD | 1 | Photo |
| 20 | 199180029 | Track | TES | WD-030130-VM | 1 | Photo |
| 21 | 121210072 | Track | US Tech | Renaissance-26 | 1 | Photo |
| 22 | 199210006 | Laser Marking System | Hankwang | HEU-1005 | 1 | Photo |
| 23 | 121210075 | Grinding&Lapping | NTS | BPG320/G2LP | 1 | Photo |
| 24 | 161160003 | Expander | CS Eng | CSE-W220 | 1 | Photo |
| 25 | 122200001 | Laminating M/C | LG | Tablet-BS4830 | 1 | Photo |
| 26 | 112180003 | Shaking Incubator | Bioneer | 600795 | 2 | Photo |
| 27 | 112170004 | 3D AOI Inspection | KOH YOUNG | KY-7100 | 1 | Photo |
| 28 | 121210012 |
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